JPH0323926U - - Google Patents

Info

Publication number

JPH0323926U

JPH0323926U JP8548389U JP8548389U JPH0323926U JP H0323926 U JPH0323926 U JP H0323926U JP 8548389 U JP8548389 U JP 8548389U JP 8548389 U JP8548389 U JP 8548389U JP H0323926 U JPH0323926 U JP H0323926U

Authority

JP

Japan

Prior art keywords

heat treatment

semiconductor manufacturing

treatment mechanism

manufacturing apparatus

pipe

Prior art date

1989-07-19

Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)

Pending

Links

• Espacenet
• Global Dossier
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• VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 10
• 238000010438 heat treatment Methods 0.000 claims description 6
• 239000000377 silicon dioxide Substances 0.000 claims description 5
• 238000004528 spin coating Methods 0.000 claims description 2
• 238000004519 manufacturing process Methods 0.000 claims 3
• 239000004065 semiconductor Substances 0.000 claims 3
• IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
• 229910001873 dinitrogen Inorganic materials 0.000 description 2
• 229910052757 nitrogen Inorganic materials 0.000 description 2
• 239000011248 coating agent Substances 0.000 description 1
• 238000000576 coating method Methods 0.000 description 1
• 229910052736 halogen Inorganic materials 0.000 description 1
• 150000002367 halogens Chemical class 0.000 description 1
• 230000006641 stabilisation Effects 0.000 description 1
• 238000011105 stabilization Methods 0.000 description 1